Shanghai AI Laboratory has achieved a breakthrough in the stable preparation of high-end photoresist resin for chip manufacturing. The project uses AI decision-making and automated synthesis to produce KrF photoresist with high purity and consistency across batches.
AI and automation enable stable high-purity photoresist.
The resin is a critical material for semiconductor lithography. The team reports high efficiency in the synthesis process. Collaborators include Xiamen University, Suzhou National Laboratory, and Xiamen Hengkun New Materials Technology Co., Ltd., which adapted the resin for terminal applications.
The breakthrough is part of the 2030 Next-Generation Artificial Intelligence National Science and Technology Major Project. According to Shanghai AI Laboratory, the achievement completely eliminates dependence on a few overseas suppliers for stable preparation of high-end photoresist resin.
The product will enter the downstream verification phase with chip manufacturing customers in China. Shanghai AI Laboratory has not confirmed a specific timeline for commercial availability.
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