Apple Prioritizes Sputtering Over ALD for Next-Gen HMO OLED Panels to Cut Costs

Apple is developing High Mobility Oxide (HMO) OLED panels, prioritizing sputtering over ALD to cut costs and simplify production for next- generation displays.

Apple OLED Panels
Apple OLED Panels

Apple has turned to the next-generation OLED panel direction of High Mobility Oxide (HMO). It's good to simplify the production and save cost for the next generation product. Because it means the production is simpler than before by silicon LTPO. And it may affect the future high-end display price and availability in the future product launch.

Apple shifts manufacturing focus to sputtering for cost savings despite ALD performance benefits

They use some of the oxide instead of silicon to increase the electron mobility. Apple focuses on the sputtering technique to make the film now due to cost-saving and the current factory. According to the insider, both Display and LG Display are considering the sputtering as a primary solution while Atomic Layer Deposition (ALD) may be the secondary choice.

  • HMO Electron Mobility Target: 30-50 cm²/Vs
  • Current Oxide TFT Electron Mobility: ~10 cm²/Vs
  • LG Display ALD Achievement: ~40 cm²/Vs

They are expecting to raise the electron mobility to ~10 cm²/Vs, which is current situation to 30-50 cm²/Vs. This significant improvement might help manufacturers to use some of oxide instead of silicon if it's good enough. As LG Display already shows that they can make ~40 cm²/Vs by ALD equipment, but they still need to consider the cost for new equipment.

Currently, no final decision is made for the production of Apple's HMO panel. So, we are in the technical review process right now. Although ALD has already proven the technical benefit on R&D stage.

But the current situation for more trials of the sputtering is related to cost-saving. It's about the trade off between the technical benefit and cost in the display supply chain.

Comments (10)

  1. Does this mean we are moving away from silicon LTPO entirely? The article mentions replacing some silicon steps but I want to know if HMO oxide will handle the entire backplane now.

    1. It is more nuanced than a full replacement. The goal is electron mobility of 30-50 cm2/Vs. If they hit that with oxide they can reduce the silicon complexity but it is not a total swap yet.

  2. I do not care about the manufacturing process until we see independent benchmarks. The article claims sputtering is the primary solution but we need real world display driver data to confirm stability.

  3. This feels like a driver optimization play. If the oxide is less stable they might just tweak the timing controller to compensate.

  4. If this lowers production costs maybe the next iPhone will actually be cheaper. I am tired of paying premium prices for incremental upgrades.

  5. The article states LG Display achieved ~40 cm2/Vs with ALD. You might be confusing the target of 30-50 with the current oxide baseline of ~10.

  6. The trade off between technical benefit and cost is real. ALD equipment is expensive and sputtering uses existing lines which speeds up the timeline.

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